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UPI PROUD SUPPORTER OF THE RICHARD A. NASCA MEMORIAL SCHOLARSHIP FOR OPTICS EXCELLENCE

Aug 30

Written by:
8/30/2016 1:22 PM  RssIcon

Contact: Justin Mahanna
(315) 896-2193
justinm@universalphotonics.com

 

Central Islip, NY (August 30, 2016) Universal Photonics is proud to be a supporter of the Richard A. Nasca Memorial Scholarship for Optics Excellence. The scholarship benefits students pursuing studies in the optics field. Recipients will be known as the Nasca Scholars at Monroe Community College (MCC), Monroe, NY, and will carry on Rick Nasca’s legacy of leadership, professionalism, passion and dedication for MCC and Optics.

The scholarship was established in 2015 by Corning Incorporated Foundation to honor Rick Nasca, a leader in finishing technology who worked tirelessly to revitalize its Optical Systems Technology Program at MCC. A total of $50,000.00 was raised at the 2016 Golf Tournament that was held in Rick’s honor in August.

Students eligible for the scholarship must be within the scope of Optics or Technology/Engineering Technologies and can be full or part-time students enrolled in the Optical Technology AAS Degree program. The award is $2,500 per semester, a total of $5,000 for the year. UPI is honored to support the next generation of optic designers, technicians and manufacturers.

Today’s optics are far-reaching, with a wider range of challenges for a growing list of substrates with a laundry list of different specifications; all driving modern surfacing technology in different ways. Universal Photonics has been in the business of critical surface preparation materials for more than 90 years. Our years of cross-industry polishing experience, along with a solid appreciation of the challenges the next generation of surfacing presents, show us that dynamic collaboration and support within the global optics community is the surest way to advance technology.

More information about the Richard A. Nasca Memorial Scholarship please visit
www.universalphotonics.com or www.monroecc.academicworks.com.

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