Central Islip, NY (July 1, 2024) Universal Photonics^® Incorporated, global manufacturer & distributor of critical surfacing & polishing technologies, introducing the latest solution in surfactant technology - UNICLEAN Application-Based Cleaners. UNICLEAN CE, UNICLEAN DSA, UNICLEAN NE remove residue & contaminants from a variety of substrates.

UNICLEAN CE is environmentally friendly, alkaline cleaner removes contaminants and residues of cerium oxide polishing slurries. Wax, additives, suspension agents, coolants and the like, are effectively cleaned off a variety of substrates with minimal rinsing. UNICLEAN DSA is this highly effective, alkaline formulation thoroughly removes residues & contaminants from a variety of substrates after polishing with diamond, colloidal silica, & aluminum oxide slurries. Residual particulates are removed, suspended, & dispersed leaving surface ion contamination significantly reduced. Engineered to be very free rinsing at ambient temperatures. UNICLEAN NE is a non alkaline, noncaustic, neutral formulation.

Universal Photonics’ dedication to the advancement of surfacing and polishing technology in all phases of fabrication spans nearly a century providing 9000+ products including polishes, pads and equipment. The company’s goal is to deliver the most advanced surfacing and production products available along with efficient sales service and expert technical assistance. Learn more about the latest solution in surfactant technology - UNICLEAN Application-Based Cleaners. For more information, please contact UPI’s expert Account Services Team at (516) 935-4000 or [email protected].

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