Unicol 12530KND (BG12530KND1)
Unicol 12530KND is a large particle product with high performance colloidal silica specifically designed for silicon wafer and specialty materials polishing applications where very precise consistence removal rates are required with minimal scratching and high planarity across the wafer surface. Unicol 12530KND contains a non drying agent which slows the crystallization of silica and facilitates easier cleaning of parts and machinery.
Unicol 50 Colloidal Silica (BC0036)
UNICOL 50 is a colloidal dispersion of silicon dioxide particles with excellent stability and medium resistance to gelling. UNICOL 50 is known as a good general use colloidal silica for a variety of applications.
Unicol 80 CE (BA00801)
Unicol 80 CE is a colloidal cerium oxide with a low particle size for finishing operations on a variety of glass substrates. Unicol 80 CE will provide low surface roughness, especially when used in conjunction with LP pads, and CP/SP polishing pitches.
Unicol 8030S (BG8030S)
UNICOL 8030S is an alkaline high purity colloidal silica specifically designed for applications where precise and consistent removal rates are required. UNICOL 8030S is designed to minimize scratch and particle defects while maximizing planarity across the wafer surface.
Unicol 8030SND (BG8030SND1)
UNICOL 8030SND is an alkaline high purity colloidal silica specifically designed for applications where precise and consistent removal rates are required. UNICOL 8030SND is designed to minimize scratch and particle defects while maximizing planarity across the wafer surface. UNICOL 8030SND contains a humectant that aids in cleaning and further reduces defects caused by dried slurry.